先进功能材料丛书--先进纳米薄膜材料：制备方法及应用= Advanced Nano Deposi

作者: 林媛编 , 陈新编

出版社: 化学工业出版社

出版时间: 2017-03

版次: 1

ISBN: 9787122291585

定价: 298.00

装帧: 精装

开本: 16开

纸张: 胶版纸

页数: 309页

字数: 5960千字

正文语种: 英语

丛书: 先进功能材料丛书

分类: 工程技术

8 张插图图片

7人买过

本书总结了纳米薄膜材料的国内外研究新进展，既详细地介绍了纳米薄膜材料的制备方法，又介绍了它们在电子器件领域的应用。系统阐述了薄膜及纳米结构的一系列制备技术，不仅包括溶胶凝胶法、MOCVD、电子束沉积、磁控溅射等传统技术，还包括近年来新发展起来的高分子辅助沉积法、3D打印、液相-电子束诱导沉积等技术。此外，本书还对纳米薄膜及其它纳米结构的一些典型应用做了介绍，并给出实例，包括磁性薄膜的应用、氧化物薄膜在燃料电池领域的应用、相变材料在存储器领域的应用和柔性薄膜器件等。

本书适合材料、微电子等相关专业的研究生、科技人员和教学人员使用。林媛教授于1999年在中国科技大学获得凝聚态物理学博士，之后分别在北京中科院物理所、美国休斯顿大学和美国洛萨莫斯国家实验室进行博士后研究，并在美国Intel公司担任高级工程师。

目前，她是电子科技大学的长江学者特聘教授。她在薄膜和纳米材料领域研究了近20年，包括使用脉冲激光沉积法、磁控溅射法和化学溶液法制备各种薄膜材料并开展其性能和应用的研究。林媛教授已发表90余篇学术论文和获得授权13项专利。 List of Contributors XIII

1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure 1

Chunrui Ma and Chonglin Chen

1.1 Introduction 1

1.2 Pulsed Laser Deposition System Setup 2

1.3 Advantages and Disadvantages of Pulsed Laser Deposition 3

1.4 TheThermodynamics and Kinetics of Pulsed Laser Deposition 3

1.4.1 Laser–Material Interactions 4

1.4.2 Dynamics of the Plasma 5

1.4.3 Nucleation and Growth of the Film on the Substrate Surface 5

1.5 Monitoring of Growth Kinetics 8

1.5.1 Introduction and RHEED Studies 8

1.5.2 Growth Kinetics Studies by Surface X-ray Diffraction 9

1.6 Fundamental Parameters in Thin Film Growth 10

1.6.1 Substrate Temperature 10

1.6.2 Background Gas Pressure 10

1.6.3 Laser Fluence and Ablation Area 11

1.6.4 Target–Substrate Distance 11

1.6.5 Post-Annealing 12

1.6.6 Lattice Misfit 12

1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth 13

1.7.1 Pulsed Laser Deposition for SuperconductorThin Film 14

1.7.2 Pulsed Laser Deposition for Ferroelectric Thin Films 14

1.7.3 Pulsed Laser Deposition for Ferromagnetic Thin Film 15

1.7.4 Pulsed Laser Deposition for Multiferroics Thin Film 15

1.7.5 Interface Strain Engineering the Complex Oxide Thin Film 16

1.7.5.1 Thickness Effect 16

1.7.5.2 Substrate Effect 17

1.7.5.3 Post-Annealing 21

1.8 Pulsed Laser Deposition for Nanostructure Growth 23

1.8.1 Self-Assembled Nanoscale Structures 23

1.8.2 Geometrically Ordered Arrays 23

1.9 Variation of Pulsed Laser Deposition 24

1.10 Conclusion 24

References 25

2 Electron Beam Evaporation Deposition 33

ZhongpingWang and Zengming Zhang

2.1 Introduction 33

2.2 Electron Beam Evaporation System 35

2.2.1 Heating Principle and Characters of Electron Beams 35

2.2.1.1 Heating Principle of Electron Beams 35

2.2.1.2 Characters of Electron Beams 36

2.2.2 Equipments of Electron Beam Source 37

2.2.2.1 Filament and Electron Emission 37

2.2.2.2 Electron Beam Control 38

2.2.2.3 Power Supply, Crucibles, and Feed Systems 39

2.2.2.4 Source Materials 40

2.2.3 Application of Electron Beam Evaporation 43

2.2.3.1 Cooling of Electron Beam Gun 43

2.2.3.2 Evaporation of Source Materials by Electron Beam 43

2.2.3.3 Vacuum Deposition Process of Electron Beam Evaporation 44

2.2.3.4 Attention andWarning for Electron Beam Evaporation 45

2.3 Characterization of Thin Film 45

2.3.1 Surface Morphology by AFM 46

2.3.2 Thickness Measurement by Spectroscopic Ellipsometry 47

2.4 Summary 53

Acknowledgments 53

References 53

3 Nanostructures and Thin Films Deposited with Sputtering 59

Weiqing Yang

3.1 Introduction 59

3.2 Nanostructures with Sputtering 60

3.2.1 Oxide Nanostructures 61

3.2.1.1 Needle-Shaped MoO3 Nanowires 61

3.2.1.2 Bi2O3 Nanowires 64

3.2.2 Nitride Nanostructures 65

3.2.2.1 Graphitic-C3N4 Nanocone Array 65

3.2.2.2 InAlN Nanorods 68

3.3 Thin Films Deposited with Sputtering 71

3.3.1 Metal AlloyThin Films 73

3.3.1.1 LaNi5 AlloyThin Films 73

3.3.1.2 Ni–Mn–In AlloyThin Films 74

3.3.2 Composite Metal Oxide Thin Films 75

3.3.2.1 BiFeO3/BaTiO3 BilayerThin Films 75

3.4 Summary 76

Acknowledgments 77

References 77

4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy 81

Wen Huang

4.1 Introduction 81

4.2 Technology of MBE 82

4.2.1 The Physics of MBE 83

4.2.2 MBE Growth Mechanisms 86

4.2.2.1 Two-Dimensional (2D) MBE Growth Mechanism 87

4.2.2.2 Three-Dimensional (3D) MBE Growth Mechanism 88

4.2.2.3 Stranskie–Krastanow 3D Growth Mechanism 90

4.3 Nanoheterostructures Fabricated by Molecular Beam Epitaxy 91

4.3.1 Semiconducting Oxide Heterostructures Grown by Laser Molecular Beam Epitaxy 91

4.3.2 Strain-Induced Magnetic Anisotropy in Highly Epitaxial Heterostructure by LMBE 96

4.4 Quantum Dots Development with Molecular Beam Epitaxy 101

4.5 Summary 103

Acknowledgments 104

References 104

5 Carbon Nanomaterials and 2D Layered Materials Development with Chemical Vapor Deposition 105

Taisong Pan

5.1 Introduction 105

5.2 Carbon Nanotube Synthesis by Chemical Vapor Deposition 106

5.2.1 Overview of CVD Process of Carbon Nanotube Growth 106

5.2.2 Control of Carbon Nanotube Structure 108

5.2.3 The Alignment of Carbon Nanotube Array 110

5.3 Graphene Synthesis by Chemical Vapor Deposition 112

5.3.1 Overview of CVD Process of Graphene Synthesis 112

5.3.2 Control of Graphene Quality 113

5.4 Metal Dichalcogenide Synthesis by Chemical Vapor Deposition 115

5.4.1 Overview of CVD Process of Metal Dichalcogenides 115

5.4.2 Growth Control of Metal Dichalcogenides in Chemical Vapor Deposition 118

5.5 Summary 119

References 120
内容简介:
本书总结了纳米薄膜材料的国内外研究新进展，既详细地介绍了纳米薄膜材料的制备方法，又介绍了它们在电子器件领域的应用。系统阐述了薄膜及纳米结构的一系列制备技术，不仅包括溶胶凝胶法、MOCVD、电子束沉积、磁控溅射等传统技术，还包括近年来新发展起来的高分子辅助沉积法、3D打印、液相-电子束诱导沉积等技术。此外，本书还对纳米薄膜及其它纳米结构的一些典型应用做了介绍，并给出实例，包括磁性薄膜的应用、氧化物薄膜在燃料电池领域的应用、相变材料在存储器领域的应用和柔性薄膜器件等。

本书适合材料、微电子等相关专业的研究生、科技人员和教学人员使用。
作者简介:
林媛教授于1999年在中国科技大学获得凝聚态物理学博士，之后分别在北京中科院物理所、美国休斯顿大学和美国洛萨莫斯国家实验室进行博士后研究，并在美国Intel公司担任高级工程师。

目前，她是电子科技大学的长江学者特聘教授。她在薄膜和纳米材料领域研究了近20年，包括使用脉冲激光沉积法、磁控溅射法和化学溶液法制备各种薄膜材料并开展其性能和应用的研究。林媛教授已发表90余篇学术论文和获得授权13项专利。
目录:
List of Contributors XIII

1 Pulsed Laser Deposition for Complex Oxide Thin Film and Nanostructure 1

Chunrui Ma and Chonglin Chen

1.1 Introduction 1

1.2 Pulsed Laser Deposition System Setup 2

1.3 Advantages and Disadvantages of Pulsed Laser Deposition 3

1.4 TheThermodynamics and Kinetics of Pulsed Laser Deposition 3

1.4.1 Laser–Material Interactions 4

1.4.2 Dynamics of the Plasma 5

1.4.3 Nucleation and Growth of the Film on the Substrate Surface 5

1.5 Monitoring of Growth Kinetics 8

1.5.1 Introduction and RHEED Studies 8

1.5.2 Growth Kinetics Studies by Surface X-ray Diffraction 9

1.6 Fundamental Parameters in Thin Film Growth 10

1.6.1 Substrate Temperature 10

1.6.2 Background Gas Pressure 10

1.6.3 Laser Fluence and Ablation Area 11

1.6.4 Target–Substrate Distance 11

1.6.5 Post-Annealing 12

1.6.6 Lattice Misfit 12

1.7 Pulsed Laser Deposition for Complex Oxide Thin Film Growth 13

1.7.1 Pulsed Laser Deposition for SuperconductorThin Film 14

1.7.2 Pulsed Laser Deposition for Ferroelectric Thin Films 14

1.7.3 Pulsed Laser Deposition for Ferromagnetic Thin Film 15

1.7.4 Pulsed Laser Deposition for Multiferroics Thin Film 15

1.7.5 Interface Strain Engineering the Complex Oxide Thin Film 16

1.7.5.1 Thickness Effect 16

1.7.5.2 Substrate Effect 17

1.7.5.3 Post-Annealing 21

1.8 Pulsed Laser Deposition for Nanostructure Growth 23

1.8.1 Self-Assembled Nanoscale Structures 23

1.8.2 Geometrically Ordered Arrays 23

1.9 Variation of Pulsed Laser Deposition 24

1.10 Conclusion 24

References 25

2 Electron Beam Evaporation Deposition 33

ZhongpingWang and Zengming Zhang

2.1 Introduction 33

2.2 Electron Beam Evaporation System 35

2.2.1 Heating Principle and Characters of Electron Beams 35

2.2.1.1 Heating Principle of Electron Beams 35

2.2.1.2 Characters of Electron Beams 36

2.2.2 Equipments of Electron Beam Source 37

2.2.2.1 Filament and Electron Emission 37

2.2.2.2 Electron Beam Control 38

2.2.2.3 Power Supply, Crucibles, and Feed Systems 39

2.2.2.4 Source Materials 40

2.2.3 Application of Electron Beam Evaporation 43

2.2.3.1 Cooling of Electron Beam Gun 43

2.2.3.2 Evaporation of Source Materials by Electron Beam 43

2.2.3.3 Vacuum Deposition Process of Electron Beam Evaporation 44

2.2.3.4 Attention andWarning for Electron Beam Evaporation 45

2.3 Characterization of Thin Film 45

2.3.1 Surface Morphology by AFM 46

2.3.2 Thickness Measurement by Spectroscopic Ellipsometry 47

2.4 Summary 53

Acknowledgments 53

References 53

3 Nanostructures and Thin Films Deposited with Sputtering 59

Weiqing Yang

3.1 Introduction 59

3.2 Nanostructures with Sputtering 60

3.2.1 Oxide Nanostructures 61

3.2.1.1 Needle-Shaped MoO3 Nanowires 61

3.2.1.2 Bi2O3 Nanowires 64

3.2.2 Nitride Nanostructures 65

3.2.2.1 Graphitic-C3N4 Nanocone Array 65

3.2.2.2 InAlN Nanorods 68

3.3 Thin Films Deposited with Sputtering 71

3.3.1 Metal AlloyThin Films 73

3.3.1.1 LaNi5 AlloyThin Films 73

3.3.1.2 Ni–Mn–In AlloyThin Films 74

3.3.2 Composite Metal Oxide Thin Films 75

3.3.2.1 BiFeO3/BaTiO3 BilayerThin Films 75

3.4 Summary 76

Acknowledgments 77

References 77

4 Nanostructures and Quantum Dots Development with Molecular Beam Epitaxy 81

Wen Huang

4.1 Introduction 81

4.2 Technology of MBE 82

4.2.1 The Physics of MBE 83

4.2.2 MBE Growth Mechanisms 86

4.2.2.1 Two-Dimensional (2D) MBE Growth Mechanism 87

4.2.2.2 Three-Dimensional (3D) MBE Growth Mechanism 88

4.2.2.3 Stranskie–Krastanow 3D Growth Mechanism 90

4.3 Nanoheterostructures Fabricated by Molecular Beam Epitaxy 91

4.3.1 Semiconducting Oxide Heterostructures Grown by Laser Molecular Beam Epitaxy 91

4.3.2 Strain-Induced Magnetic Anisotropy in Highly Epitaxial Heterostructure by LMBE 96

4.4 Quantum Dots Development with Molecular Beam Epitaxy 101

4.5 Summary 103

Acknowledgments 104

References 104

5 Carbon Nanomaterials and 2D Layered Materials Development with Chemical Vapor Deposition 105

Taisong Pan

5.1 Introduction 105

5.2 Carbon Nanotube Synthesis by Chemical Vapor Deposition 106

5.2.1 Overview of CVD Process of Carbon Nanotube Growth 106

5.2.2 Control of Carbon Nanotube Structure 108

5.2.3 The Alignment of Carbon Nanotube Array 110

5.3 Graphene Synthesis by Chemical Vapor Deposition 112

5.3.1 Overview of CVD Process of Graphene Synthesis 112

5.3.2 Control of Graphene Quality 113

5.4 Metal Dichalcogenide Synthesis by Chemical Vapor Deposition 115

5.4.1 Overview of CVD Process of Metal Dichalcogenides 115

5.4.2 Growth Control of Metal Dichalcogenides in Chemical Vapor Deposition 118

5.5 Summary 119

References 120

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先进功能材料丛书--先进纳米薄膜材料：制备方法及应用= Advanced Nano Deposi

内容简介:

作者简介:

目录: